New silicon dielectrics processed via low-temperature Plasma Enhanced - Atomic Layer Deposition (ALD) technology enables flexible OLEDs in superior display devices. Provides highly improved barrier characteristics: 100 times more effective and 20 times thinner than existing solutions. Wins Display Component of the Year 2023 Award from Society for Information Display (SID).

Patents cover nanofilm technology for noiseless low-signal amplification, critical to emerging scientific and commercial applications

Arradiance and InRedox will provide new ALD-functionalized Nanoceramics

Coupling Arradiance's formidable Atomic Layer Deposition (ALD) foundry service with the world class analytical and engineering resources of MicroLabs Scientific to provide researchers access to nanofilm development, characterization and deep expertise.

The Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source.

RASIRC announced independent test results that show high purity hydrogen peroxide vapor delivered to process by RASIRC technology enables removal of carbon-based contaminants from Germanium surfaces.

RASIRC® will begin public discussions on its new Dry Peroxide(TM) vapor delivery system at the upcoming Atomic Layer Deposition (ALD) conference and will present a poster "New Hydrogen Peroxide Vapor Delivery Systems for Surface Preparation and AL

RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference.