RASIRC Enables Liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning
RASIRC®, the leader in delivery of dynamic vapors, announced that the company will discuss delivery of ultra high purity hydrogen peroxide vapor at the upcoming 12th International UCPSS Symposium, September 21-24, 2014 in Brussels, Belgium.
San Diego, CA, September 15, 2014 (Newswire.com) - Company to discuss results at Ultra Clean Processing of Semiconductor Surfaces Symposium
RASIRC®, the leader in delivery of dynamic vapors, announced that the company will discuss delivery of ultra high purity hydrogen peroxide vapor at the upcoming 12th International UCPSS Symposium, September 21-24, 2014 in Brussels, Belgium. During the exhibition RASIRC representatives will be available to provide details on recent test results that show the generation and controlled delivery of hydrogen peroxide vapor from a liquid source.
“High concentration hydrogen peroxide is a superior chemistry for gentle surface preparation and cleaning,” says Jeffrey Spiegelman, president and founder of RASIRC. “By understanding the physics of Raoult’s law, our Peroxidizer™ technology overcomes the challenges of hydrogen peroxide vapor which include safety, stability, repeatability, and particle free delivery at low to high concentrations.”
Recent tests confirm that hydrogen peroxide concentrations as high as 30,000 ppm can be generated and sustained from standard semiconductor grade 30% weight H2O2 solution. This will enable new uses for hydrogen peroxide in vapor phase cleaning, surface preparation, and thin film growth in both FEOL and BEOL processes.
“Just one more step realized in RASIRC’s vision to be the provider vapor phase chemistries. We will assist IC manufacturers by the obsolescence of wet processing with innovative new dry processing technology,” says Spiegelman. “The Peroxidizer demonstrates RASIRC’s commitment to enable dry cleaning of semiconductor wafers needed to sustain Moore’s law.”
Look for RASIRC in the exhibitor area during breaks and reception, email firstname.lastname@example.org or go to www.rasirc.com for more information.