Organometallics R&D and Manufacturing Company Seeks Greater Market Penetration in Semiconductor, Nanotechnology, Photovoltaics, Optoelectronics & Specialty Chemicals

New data reveals optimization opportunities in throughput and precursor utilization

RASIRC renewed its funding agreement with the University of California, San Diego (UCSD) for on-going semiconductor processing research. Professor Andrew Kummel of the Department of Chemistry represents UCSD in this agreement. The gift donation supports one student for one year. RASIRC made a similar gift donation last year. RASIRC manufactures BRUTE® hydrogen peroxide and hydrazine vaporizers for emerging ALD applications.

BRUTE™ Peroxide enables dry peroxide gas delivery for ALD Oxide Growth. RASIRC today released research results showing that anhydrous hydrogen peroxide gas enables a five-fold increase in surface hydroxyl density when compared to water in studies involving ALD nucleation on SiGe substrates. Hydroxyl density is an important factor in minimizing interfacial defects, increasing uniformity and improving next generation semiconductor device performance.

Company presents technical sessions and exhibits at AVS Symposium

RASIRC will showcase a family of new technologies at the AVS 62nd International Symposium & Exhibition. Hydrogen peroxide gas with and without water and recent data on hydrazine gas for processing next generation semiconductor materials will be covered in two oral presentations and an exhibit (booth #437).

RASIRC to present posters and exhibit (Booth #39) at 15th Int'l Conference on Atomic Layer Deposition & ALE Workshop. The companies will showcase hydrogen peroxide gas with or without water. Posters are entitled "In-Situ Monitoring of Hydrogen Peroxide Vapor Delivery Systems for ALD" and "Novel Hydrogen Peroxide Delivery Systems for Atomic Layer Cleaning and Etch".

The Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source.

Eon-ID™ technology an exceptional, affordable alternative to aging competitor models

RASIRC® will begin public discussions on its new Dry Peroxide(TM) vapor delivery system at the upcoming Atomic Layer Deposition (ALD) conference and will present a poster "New Hydrogen Peroxide Vapor Delivery Systems for Surface Preparation and AL

RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference.

RASIRC presented "New Vaporization Source for H2O2 for Pre-Treatment/Cleaning of ALD Deposition Surfaces" at Sematech Surface Preparation & Cleaning Conf., showing advantages of dry chemistries to address contamination & reduce chemical consumpti

RASIRC has been awarded ISO 9001:2008 certification, demonstrating the company's commitment to high quality and continuous improvement in all its policies, procedures and practices.

ALD Ltd. annouces the release of RAM Commander new version 8.2 - The new version provides many improvements and new features in the Reliability prediction module, Safety module, FMECA, FTA, MARKOV, MMEL, P&D FMEA, MSG-3 and more.